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Atomic Diffusion in III-V Semiconductors
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Atomic Diffusion in III-V Semiconductors

Book Details

Format Hardback or Cased Book
ISBN-10 0852743513
ISBN-13 9780852743515
Publisher Taylor & Francis Ltd
Imprint Institute of Physics Publishing
Country of Manufacture GB
Country of Publication GB
Publication Date Jan 1st, 1988
Print length 244 Pages
Weight 470 grams
Dimensions 21.90 x 14.50 x 2.20 cms
Ksh 11,900.00
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This book presents a lucid account of the experimental work that has been carried out on diffusion in III-Vs and explores the advanced models that explain the results. It outlines the special properties of the III-V group of semiconductors. Discussion of the basic elements of diffusion in semiconductors provides the theory necessary to understand the subject in depth, and the book gives hints on how to assess the published data. Chapters on diffusion of shallow donors, shallow acceptors, transition elements, and very fast-diffusing elements provide a critical review of published works. The book also presents the neglected subject of self-diffusion, including a section on superlattices.
III-V semiconductors, of which gallium arsenide is the best known, have been important for some years and appear set to become much more so in the future. They have principally contributed to two technologies: microwave devices and optoelectronics. Recent advances in the production of thin layers have made possible a whole new range of devices based on multi-quantum wells. The heat treatments used in the manufacture of semiconductor devices means that some diffusion must take place. A good understanding of diffusion processes is therefore essential to maintain control over the technology.

Atomic Diffusion in III-V Semiconductors presents a lucid account of the experimental work that has been carried out on diffusion in III-Vs and explores the advanced models that explain the results. A review of the III-V group of semiconductors outlines the special properties that make them so attractive for some types of devices. Discussion of the basic elements of diffusion in semiconductors provides the theory necessary to understand the subject in depth, and the book gives hints on how to assess the published data. Chapters on diffusion of shallow donors, shallow acceptors, transition elements, and very fast-diffusing elements provide a critical review of published works. The book also presents the neglected subject of self-diffusion, including a section on superlattices. Atomic Diffusion in III-V Semiconductors will be of interest to research workers in semiconductor science and technology, and to postgraduate students in physics, electronics, and materials science.

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