Atomic Layer Deposition: Principles, cs, and Nanotechnology Applications, Second Editio n : Principles, Characteristics, and Nanotechnology Applications
by
T Kääriäinen
Book Details
Format
Hardback or Cased Book
ISBN-10
1118062779
ISBN-13
9781118062777
Publisher
John Wiley & Sons Inc
Imprint
Wiley-Scrivener
Country of Manufacture
US
Country of Publication
GB
Publication Date
Jun 28th, 2013
Print length
272 Pages
Weight
582 grams
Dimensions
16.40 x 24.00 x 2.50 cms
Product Classification:
Electronic devices and materialsSemi-conductors & super-conductors
Ksh 31,500.00
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
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