Engineering Thin Films and Nanostructures with Ion Beams
Book Details
Format
Paperback / Softback
ISBN-10
0367393050
ISBN-13
9780367393052
Publisher
Taylor & Francis Ltd
Imprint
CRC Press
Country of Manufacture
GB
Country of Publication
GB
Publication Date
Jun 19th, 2019
Print length
592 Pages
Weight
1,100 grams
Product Classification:
Optical physicsNanotechnologyMaterials science
Ksh 13,200.00
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The use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Thin Films and Nanostructures with Ion Beams provides a complete retrospective of the technology and illustrates the wider landscape for which ion beam techniques are becoming increasingly applicable. It includes a CD-ROM with video clips from an electron microscope that details crater formation and annealing by ion beams.
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications.
Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that:
Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces
Considers how ion-beam techniques can help achieve higher disk-drive densities
Introduces gas-cluster ion-beam technology and reviews its precedents
Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties
Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting
Examines the combination of ion-beam techniques, particularly with physical vapor deposition
Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques
Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation
Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams
From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that:
From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Get Engineering Thin Films and Nanostructures with Ion Beams by at the best price and quality guaranteed only at Werezi Africa's largest book ecommerce store. The book was published by Taylor & Francis Ltd and it has pages.
