Extreme Ultraviolet Lithography
Book Details
Format
Paperback / Softback
Book Series
Press Monographs
ISBN-10
151063939X
ISBN-13
9781510639393
Publisher
SPIE Press
Imprint
SPIE Press
Country of Manufacture
US
Country of Publication
GB
Publication Date
Dec 30th, 2020
Print length
245 Pages
Weight
440 grams
Dimensions
17.60 x 25.20 x 1.60 cms
Product Classification:
Circuits & componentsElectronics: circuits and componentsApplied optics
Ksh 9,350.00
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Covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Each topic is approached from the perspective of a practicing lithographer.
This book covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Lithography costs, which have often influenced the areas of technical focus, are discussed. Potential improvements to current EUV technology and extensions to future nodes are also covered. Each topic is approached from the perspective of a practicing lithographer in a wafer fab, in either manufacturing or development, and there are many references at the end of each chapter.
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