Book Details
Format
Paperback / Softback
Book Series
Press Monographs
ISBN-10
1510692533
ISBN-13
9781510692534
Edition
Second Edition
Publisher
SPIE Press
Imprint
SPIE Press
Country of Manufacture
GB
Country of Publication
GB
Publication Date
Mar 13th, 2026
Print length
344 Pages
Weight
744 grams
Dimensions
17.80 x 25.50 x 2.00 cms
Product Classification:
Applied optics
Ksh 10,700.00
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Discover refined techniques in EUV lithography with updates detailing exposure tools, light sources, masks, resists, metrology, and computational lithography. Addressing cost and process control, the work offers practical insights from a seasoned lithographer operating in manufacturing and development.
In this second edition of Extreme Ultraviolet Lithography, coverage is maintained on the fundamental aspects of EUV lithographic technology for topics such as exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Lithography costs, which have often influenced areas of technical focus, are also discussed. Many updates are included that reflect the significant advances in EUV lithography since the publication of the first edition. All topics are approached from the perspective of a practicing lithographer in a wafer fab, working in either manufacturing or development, and there are many references at the end of each chapter.
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