Low-K Nanoporous Interdielectrics : Materials, Thin Film Fabrications, Structures & Properties
Book Details
Format
Paperback / Softback
ISBN-10
1616687495
ISBN-13
9781616687496
Publisher
Nova Science Publishers Inc
Imprint
Nova Science Publishers Inc
Country of Manufacture
US
Country of Publication
GB
Publication Date
Mar 19th, 2011
Print length
67 Pages
Weight
138 grams
Dimensions
23.00 x 15.50 x 0.50 cms
Product Classification:
NanotechnologyElectronics engineering
Ksh 11,150.00
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The use of low dielectric constant (low-k) interdielectrics in multilevel structure integrated circuits (ICs) can lower line-to-line noise in interconnects and alleviate power dissipation issues by reducing the capacitance between the interconnect conductor lines. Because of these merits, low-k interdielectric materials are currently in high demand in the development of advanced ICs. One important approach to obtaining low-k values is the incorporation of nanopores into dielectrics. This book provides an overview of the methodologies and characterisation techniques used for investigating low-k nanoporous interdielectrics.
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