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Machine Learning-Based Modelling in Atomic Layer Deposition Processes
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Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Book Details

Format Hardback or Cased Book
ISBN-10 1032386703
ISBN-13 9781032386706
Publisher Taylor & Francis Ltd
Imprint CRC Press
Country of Manufacture GB
Country of Publication GB
Publication Date Dec 15th, 2023
Print length 354 Pages
Weight 662 grams
Ksh 33,850.00
Werezi Extended Catalogue 0 in stock

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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.


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