Machine Learning-Based Modelling in Atomic Layer Deposition Processes
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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
Get Machine Learning-Based Modelling in Atomic Layer Deposition Processes by Oluwatobi Adeleke, Sina Karimzadeh at the best price and quality guaranteed only at Werezi Africa's largest book ecommerce store. The book was published by Taylor & Francis Ltd and it has 354 pages.
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