Optical Physics for Nanolithography
Book Details
Format
Paperback / Softback
Book Series
Press Monographs
ISBN-10
151061737X
ISBN-13
9781510617377
Publisher
SPIE Press
Imprint
SPIE Press
Country of Manufacture
US
Country of Publication
GB
Publication Date
May 30th, 2018
Print length
352 Pages
Weight
1,020 grams
Product Classification:
Applied optics
Ksh 14,600.00
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Provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essential principles, and all derivations are presented with their intermediate steps.
This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essential principles, and all derivations are presented with their intermediate steps. For increased accessibility, simplified and consistent notations are used throughout the text. Full-color pages illustrate the connections between figures and equations.
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