Pattern Analysis and Machine Intelligence : Second International Conference, ICPAMI 2025, Dalian, China, October 31 - November 2, 2025, Revised Selected Papers
Book Details
Format
Paperback / Softback
ISBN-10
981959524X
ISBN-13
9789819595242
Publisher
Springer Verlag, Singapore
Imprint
Springer Verlag, Singapore
Country of Manufacture
GB
Country of Publication
GB
Publication Date
Jul 2nd, 2026
Print length
232 Pages
Product Classification:
Electronics engineeringMachine learningPattern recognitionComputer visionImage processing
Ksh 10,800.00
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This book constitutes the referred proceedings of the Second International Conference on Pattern Analysis and Machine Intelligence, ICPAMI 2025, held in Dalian, China, during August 29–31, 2025. The 23 papers presented here were carefully reviewed and selected from 51 submissions. Their insightful talks covered the applications, challenges, and future directions of Multimodal Foundation and Large Language Models, the frontiers and perspectives in 3D Spatial Video Reconstruction, and research on defenses and out-of-distribution detection in trustworthy deep learning.
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