Photon Sources for Lithography and Metrology
Book Details
Format
Hardback or Cased Book
Book Series
Press Monographs
ISBN-10
1510653716
ISBN-13
9781510653719
Publisher
SPIE Press
Imprint
SPIE Press
Country of Manufacture
GB
Country of Publication
GB
Publication Date
Oct 31st, 2023
Print length
1320 Pages
Weight
1,027 grams
Product Classification:
Optical physicsApplied optics
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Photon sources enable the extension of lithography and metrology technologies forcontinued scaling of circuit elements and therefore are the key drivers for the extension of Moore's law. This volume is the authoritative reference on photon source technology and includes contributions from leading researchers and suppliers in the field.
Photon sources enable the extension of lithography and metrology technologies forcontinued scaling of circuit elements and therefore are the key drivers for the extensionof Moore''s law. This comprehensive, 28-chapter volume is the authoritative referenceon photon source technology and includes contributions from leading researchers andsuppliers in the photon source field. It is intended to meet the needs of bothpractitioners of the technology and readers seeking a thorough introduction to EUVphoton sources and their applications.
Topics include a state-of-the-art overview and in-depth explanation of photons sourcerequirements, fundamental atomic data and theoretical models of EUV sources basedon discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), a descriptionof prominent DPP and LPP designs, and other technologies for producing EUV radiationat 13.5 nm. Additionally, this volume contains detailed descriptions of 193-nm excimerlasers, UV lamps, and laser-driven plasma sources for UV photons, all of which powermany current lithography and metrology tools. CO2 lasers and 1-?m Nd-YAG lasers, usedfor pre-pulse in Sn LPP EUV sources, are also covered.
Alternative photon sources for 13.5-nm lithography and metrology, such as highharmonicgeneration (HHG) and synchrotrons, along with their usage as a metrologytool, are discussed; and potential future photon sources such as free-electron lasers(FELs), solid-state 2-?m thulium lasers, and 1-?m Nd-YAG lasers are described.Additional topics include EUV source metrology, plasma diagnostics of EUV plasmas,grazing and normal incidence collector optics for plasma sources, debris mitigation, andmechanisms of component erosion in EUV sources.
Topics include a state-of-the-art overview and in-depth explanation of photons sourcerequirements, fundamental atomic data and theoretical models of EUV sources basedon discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), a descriptionof prominent DPP and LPP designs, and other technologies for producing EUV radiationat 13.5 nm. Additionally, this volume contains detailed descriptions of 193-nm excimerlasers, UV lamps, and laser-driven plasma sources for UV photons, all of which powermany current lithography and metrology tools. CO2 lasers and 1-?m Nd-YAG lasers, usedfor pre-pulse in Sn LPP EUV sources, are also covered.
Alternative photon sources for 13.5-nm lithography and metrology, such as highharmonicgeneration (HHG) and synchrotrons, along with their usage as a metrologytool, are discussed; and potential future photon sources such as free-electron lasers(FELs), solid-state 2-?m thulium lasers, and 1-?m Nd-YAG lasers are described.Additional topics include EUV source metrology, plasma diagnostics of EUV plasmas,grazing and normal incidence collector optics for plasma sources, debris mitigation, andmechanisms of component erosion in EUV sources.
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