Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
Softcover Reprint of the Original 1st 2018 ed.
Book Details
Format
Paperback / Softback
Book Series
NanoScience and Technology
ISBN-10
3030094553
ISBN-13
9783030094553
Edition
Softcover Reprint of the Original 1st 2018 ed.
Publisher
Springer Nature Switzerland AG
Imprint
Springer Nature Switzerland AG
Country of Manufacture
GB
Country of Publication
GB
Publication Date
Feb 8th, 2019
Print length
138 Pages
Weight
246 grams
Dimensions
23.40 x 15.40 x 1.20 cms
Product Classification:
Science: general issuesCondensed matter physics (liquid state & solid state physics)Condensed matter physics (liquid state and solid state physics)NanotechnologyMechanical engineeringElectronics engineeringCircuits & componentsElectronics: circuits and componentsElectronic devices & materialsElectronic devices and materialsOther technologies & applied sciencesOther technologies and applied sciences
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This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification.
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Get Physical Design and Mask Synthesis for Directed Self-Assembly Lithography by at the best price and quality guaranteed only at Werezi Africa's largest book ecommerce store. The book was published by Springer Nature Switzerland AG and it has pages.
