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Plasma Etching

By: Hachinohe Institute of Technology) Sugawara Professor M. (Professor (Author)

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Ksh 52,550.00

Format: Hardback or Cased Book

ISBN-13: 9780198562870

Publisher: Oxford University Press

Publication Date: May 28th, 1998

Weight: 743 grams

Dimension: 24.20 x 16.30 x 2.30 cms

Category: Plasma physics

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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

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