Book Details
Format
Hardback or Cased Book
Book Series
Press Monographs
ISBN-10
151062760X
ISBN-13
9781510627604
Edition
Fourth Edition
Publisher
SPIE Press
Imprint
SPIE Press
Country of Manufacture
US
Country of Publication
GB
Publication Date
Jul 30th, 2019
Print length
630 Pages
Weight
1,422 grams
Dimensions
18.50 x 26.20 x 3.10 cms
Ksh 15,150.00
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This newest edition of Principles of Lithography reflects the continuing advancement of lithographic technology. In recent years, certain topics, such as line-edge roughness (LER), multi-electron-beam writers, have become more significant to practicing lithographers. As such extensive treatments of these topics are provided.
This newest edition of Principles of Lithography reflects the continuing advancement of lithographic technology. In recent years, certain topics, such as line-edge roughness (LER), multi-electron-beam writers, and nonlinear overlay models, have become much more significant to practicing lithographers, and more extensive treatments are therefore provided. EUV lithography is on the threshold for use in high-volume manufacturing, at nodes where a number of complex phenomena are relevant, and the chapter on EUV lithography has been expanded accordingly. New references and homework problems have been added. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
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