Silicon Technologies : Ion Implantation and Thermal Treatment
Book Details
Format
Hardback or Cased Book
ISBN-10
1848212313
ISBN-13
9781848212312
Publisher
ISTE Ltd and John Wiley & Sons Inc
Imprint
ISTE Ltd and John Wiley & Sons Inc
Country of Manufacture
GB
Country of Publication
GB
Publication Date
Jun 10th, 2011
Print length
368 Pages
Weight
676 grams
Dimensions
15.60 x 23.90 x 2.70 cms
Product Classification:
Electronics engineering
Ksh 25,750.00
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* Specifically in the field of microelectronics, the self-fulfilling power of Moore s Law has driven an amazing pace of technological advances * This book explains the fundamental physical and chemical rules in major front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion .
This book has been written to provide newly arrived engineers in a silicon foundry environment with a comprehensive background in the fundamental physical and chemical basis for major front-end silicon treatments, such as oxidation, epitaxy, ion implantation and impurities diffusion, as well as giving a survey of the major types of equipment used in integrated circuit (IC) chip foundries. Techniques include various forms of chemical vapor deposition (CVD), epitaxy, thin film technologies, lithography, masking, and other nanotechnologies. As well as the target audience, the book will also be of great interest to engineers and advanced students in all these and related fields of electrical engineering, materials science, and manufacturing.
Get Silicon Technologies by at the best price and quality guaranteed only at Werezi Africa's largest book ecommerce store. The book was published by ISTE Ltd and John Wiley & Sons Inc and it has pages.
