Simulation of Deposition Processes with PECVD Apparatus
Book Details
Format
Hardback or Cased Book
ISBN-10
1621003655
ISBN-13
9781621003656
Publisher
Nova Science Publishers Inc
Imprint
Nova Science Publishers Inc
Country of Manufacture
US
Country of Publication
GB
Publication Date
Jan 1st, 2012
Print length
144 Pages
Weight
352 grams
Dimensions
23.40 x 16.20 x 1.40 cms
Product Classification:
Materials science
Ksh 18,350.00
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This book discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models.
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