Sub-Half-Micron Lithography for ULSIs
Book Details
Format
Paperback / Softback
ISBN-10
0521022347
ISBN-13
9780521022347
Publisher
Cambridge University Press
Imprint
Cambridge University Press
Country of Manufacture
GB
Country of Publication
GB
Publication Date
Nov 10th, 2005
Print length
344 Pages
Weight
616 grams
Dimensions
24.50 x 17.90 x 1.80 cms
Product Classification:
Computer science
Ksh 7,200.00
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This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. Several important lithography methods, such as deep UV, X-ray, electron-beam, and focused ion-beam lithography are described in detail by experts. The principles underlying each of the techniques are illustrated at the beginning of each chapter.
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