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Sub-Half-Micron Lithography for ULSIs
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Sub-Half-Micron Lithography for ULSIs

Book Details

Format Paperback / softback
ISBN-10 0521022347
ISBN-13 9780521022347
Publisher Cambridge University Press
Imprint Cambridge University Press
Country of Manufacture GB
Country of Publication GB
Publication Date Nov 10th, 2005
Print length 344 Pages
Weight 616 grams
Dimensions 24.50 x 17.90 x 1.80 cms
Product Classification: Computer science
KSh 7,550.00
Currently unavailable 0 in stock

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This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. Several important lithography methods, such as deep UV, X-ray, electron-beam, and focused ion-beam lithography are described in detail by experts. The principles underlying each of the techniques are illustrated at the beginning of each chapter.

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