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Sub-Half-Micron Lithography for ULSIs

By: Japan) Suzuki Tsukuba Katsumi (NEC Corporation (Author) , Himeji Institute of Technology) Matsui Shinji (Nano-scale Science and Technology Group (Author) , Japan) Ochiai Tsukuba Yukinori (NEC Corporation (Author)

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Ksh 7,450.00

Format: Paperback or Softback

ISBN-13: 9780521022347

Publisher: Cambridge University Press

Publication Date: Nov 10th, 2005

Weight: 616 grams

Dimension: 24.50 x 17.90 x 1.80 cms

Category: COMPUTER SCIENCE

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This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. Several important lithography methods, such as deep UV, X-ray, electron-beam, and focused ion-beam lithography are described in detail by experts. The principles underlying each of the techniques are illustrated at the beginning of each chapter.

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