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Techniques and Challenges for 300 mm Silicon: Processing, Characterization, Modelling and Equipment

By: Germany) Richter Franfurt (Oder) H. (Institute for Semiconductor Physics (Author) , Germany) Wagner Burghausen P. (Wacker Siltronic AG (Author) , USA) Ritter Kalispell G. (SEMITOOL Inc (Author)

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Format: Hardback or Cased Book

ISBN-13: 9780080436098

Publisher: Elsevier Science & Technology

Publication Date: Sep 8th, 1999

Dimension: 27.80 x 21.00 x 67.00 cms

Category: Circuits & components

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Includes papers that cover the E-MRS conference on Techniques and Challenges for 300 mm Silicon: Processing, Characterization, Modeling and Equipment. This book covers a wide range of subjects, financial issues, fab concepts, crystal growth, wafer process development, material and defect issues, and wafer characterization.

Get Techniques and Challenges for 300 mm Silicon: Processing, Characterization, Modelling and Equipment by H. (Institute for Semiconductor Physics, Franfurt (Oder), Germany) Richter at the best price and quality guranteed only at Werezi Africa largest book ecommerce store. The book was published by Elsevier Science & Technology and it has pages. Enjoy Shopping Best Offers & Deals on books Online from Werezi - Receive at your doorstep - Fast Delivery - Secure mode of Payment

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