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Topics in Electron Diffraction and Microscopy of Materials
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Topics in Electron Diffraction and Microscopy of Materials

Book Details

Format Hardback or Cased Book
ISBN-10 075030538X
ISBN-13 9780750305389
Publisher Taylor & Francis Ltd
Imprint Institute of Physics Publishing
Country of Manufacture GB
Country of Publication GB
Publication Date Jan 1st, 1999
Print length 208 Pages
Weight 317 grams
Product Classification: MicroscopyPhysicsCrystallography
Ksh 31,500.00
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Offers an overview of applications for selected electron microscope techniques that have become widespread in their use for furthering our understanding of how materials behave. This work discusses topics including weak-beam techniques for problem solving, defect structures and dislocation interactions, and atomic level imaging applications.
Topics in Electron Diffraction and Microscopy of Materials celebrates the retirement of Professor Michael Whelan from the University of Oxford. Professor Whelan taught many of today''s heads of department and was a pioneer in the development and use of electron microscopy. His collaborators and colleagues, each one of whom has made important advances in the use of microscopy to study materials, have contributed to this cohesive work.

The book provides a useful overview of current applications for selected electron microscope techniques that have become important and widespread in their use for furthering our understanding of how materials behave. Linked through the dynamical theory of electron diffraction and inelastic scattering, the topics discussed include the history and impact of electron microscopy in materials science, weak-beam techniques for problem solving, defect structures and dislocation interactions, using beam diffraction patterns to look at defects in structures, obtaining chemical identification at atomic resolution, theoretical developments in backscattering channeling patterns, new ways to look at atomic bonds, using numerical simulations to look at electronic structure of crystals, RHEED observations for MBE growth, and atomic level imaging applications.

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