Topological Structures in Ferroic Materials : Domain Walls, Vortices and Skyrmions
Softcover reprint of the original 1st ed. 2016
Book Details
Format
Paperback / Softback
Book Series
Springer Series in Materials Science
ISBN-10
3319797638
ISBN-13
9783319797632
Edition
Softcover reprint of the original 1st ed. 2016
Publisher
Springer International Publishing AG
Imprint
Springer International Publishing AG
Country of Manufacture
CH
Country of Publication
GB
Publication Date
Mar 16th, 2019
Print length
241 Pages
Product Classification:
Science: general issuesCondensed matter physics (liquid state & solid state physics)Condensed matter physics (liquid state and solid state physics)Electricity, electromagnetism & magnetismElectricity, electromagnetism and magnetismNanotechnologyElectronic devices & materialsElectronic devices and materials
Ksh 19,800.00
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This book provides a state-of-the art overview of a highly interesting emerging research field in solid state physics/nanomaterials science, topological structures in ferroic materials.
This book provides a state-of-the art overview of a highly interesting emerging research field in solid state physics/nanomaterials science, topological structures in ferroic materials. Topological structures in ferroic materials have received strongly increasing attention in the last few years. Such structures include domain walls, skyrmions and vortices, which can form in ferroelectric, magnetic, ferroelastic or multiferroic materials. These topological structures can have completely different properties from the bulk material they form in. They also can be controlled by external fields (electrical, magnetic, strain) or currents, which makes them interesting from a fundamental research point of view as well as for potential novel nanomaterials applications. To provide a comprehensive overview, international leading researches in these fields contributed review-like chapters about their own work and the work of other researchers to provide a current view of this highly interesting topic.
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