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Advances in CMP Polishing Technologies

By: Japan) Doi Kyushu University Department of Mechanical Engineering Toshiro (Professor of Manufacturing Processes (Author) , USA) Marinescu OH Toledo The University of Toledo Precision Micromachining Center Ioan D. (Professor and Director (Author) , Syuhei Kurokawa (Author)

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Ksh 25,900.00

Format: Hardback or Cased Book

ISBN-13: 9781437778595

Publisher: William Andrew Publishing

Publication Date: Dec 20th, 2011

Weight: 616 grams

Dimension: 23.90 x 16.00 x 2.30 cms

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CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R&D accessible to the wider engineering community.

Get Advances in CMP Polishing Technologies by Toshiro (Professor of Manufacturing Processes, Department of Mechanical Engineering, Kyushu University, Japan) Doi at the best price and quality guranteed only at Werezi Africa largest book ecommerce store. The book was published by William Andrew Publishing and it has pages. Enjoy Shopping Best Offers & Deals on books Online from Werezi - Receive at your doorstep - Fast Delivery - Secure mode of Payment

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