Book Details
Format
Hardback or Cased Book
Book Series
Press Monographs
ISBN-10
1510639950
ISBN-13
9781510639959
Edition
Second Edition
Publisher
SPIE Press
Imprint
SPIE Press
Country of Manufacture
GB
Country of Publication
GB
Publication Date
Nov 30th, 2021
Print length
580 Pages
Weight
1,522 grams
Dimensions
18.60 x 26.10 x 3.80 cms
Product Classification:
Circuits & componentsElectronics: circuits and components
Ksh 16,150.00
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Written for new and experienced engineers, technology managers, and senior technicians, readers of this book will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization.
This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author''s unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
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