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Plasma Etching

By: New Jersey) Manos Dennis (Princeton University (Author) , New Jersey) Flamm Murray Hill Daniel (AT&T Bell Laboratories (Author)

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Format: Hardback or Cased Book

ISBN-13: 9780124693708

Publisher: Elsevier Science Publishing Co Inc

Publication Date: Sep 8th, 1989

Dimension: 22.90 x 15.20 x 75.00 cms

Category: TECHNOLOGY: GENERAL ISSUES

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Plasma etching plays an essential role in microelectronic circuit manufacturing. Useful for researchers, process engineers, and students, this book introduces the physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. It offers practical examples of process chemistry, equipment design, and production methods.

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