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Plasma Sources for Thin Film Deposition and Etching

By: U.S.A.) Francombe Atlanta Maurice H. (Georgia State University (Author) , New Jersey) Vossen Princeton John L. (RCA Laboratories (Author)

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Format: Hardback or Cased Book

ISBN-13: 9780125330183

Publisher: Elsevier Science Publishing Co Inc

Publication Date: Sep 29th, 1994

Weight: 642 grams

Dimension: 15.80 x 23.60 x 2.70 cms

Category: Condensed matter physics

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Includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalanced magnetron sputtering, and particle formation in thin film processing plasma.

Get Plasma Sources for Thin Film Deposition and Etching by Maurice H. (Georgia State University, Atlanta, U.S.A.) Francombe at the best price and quality guranteed only at Werezi Africa largest book ecommerce store. The book was published by Elsevier Science Publishing Co Inc and it has pages. Enjoy Shopping Best Offers & Deals on books Online from Werezi - Receive at your doorstep - Fast Delivery - Secure mode of Payment

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