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Rapid Thermal Processing for Future Semiconductor Devices

By: Japan) Fukuda Hokkaido Muroran Mizumoto-cho Department of Electrical and Electronic Engineering H. (Muroran Institute of Technology (Author)

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Format: Paperback or Softback

ISBN-13: 9780444513397

Publisher: Elsevier Science & Technology

Publication Date: Apr 2nd, 2003

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A collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. It covers the following areas such as advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe and hetero-structure.

Get Rapid Thermal Processing for Future Semiconductor Devices by H. (Muroran Institute of Technology, Department of Electrical and Electronic Engineering, Mizumoto-cho, Muroran, Hokkaido, Japan) Fukuda at the best price and quality guranteed only at Werezi Africa largest book ecommerce store. The book was published by Elsevier Science & Technology and it has pages. Enjoy Shopping Best Offers & Deals on books Online from Werezi - Receive at your doorstep - Fast Delivery - Secure mode of Payment

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