Monte Carlo Modeling for Electron Microscopy and Microanalysis

This book is a practical guide to the use of Monte Carlo simulation techniques for the study of electron solid interactions in the electron microscope. Programs, optimized for use on personal computers, are developed to deal with typical applications including secondary, and back- scattered, electron imaging. EBIC imaging of semiconductors and X-ray microanalysis.

This book describes how Monte Carlo modeling methods can be applied to Electron Microscopy and Microanalysis. Computer programs for two basic types of Monte carlo simulation are developed from physical models of the electron scattering process; a Single Scattering program capable of high accuracy but requiring long computation times, and a Plural Scattering program which is less accurate but much more rapid. The programs are optimised for use on personal computers and provide a real time graphical display of the interaction. These programs are then used as the starting point for the development of programs aimed at studying particular effects in the electron microscope including backscattering, secondary electron production, EBIC and cathodo- luminescence imaging, and X- ray microanalysis. The computer code is given in a fully annotated format so that it may be readily be modified for use in specific problems. Many examples of the applications of these methods are provided, together with a complete bibliography.